| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an Nb sputtering target in which the amount of prescribed impurities is reduced and variability in dispersed state is suppressed. <P>SOLUTION: In the Nb sputtering target, the sum total of Al, Si, Ge and Mg contained in the target is made to ≤100 ppm (including 0 ppm) and the sum total of C, O, N, F and S is made to ≤300 ppm (including 0 ppm), and further, the variability of the elements is suppressed to ≤30%. By this method, variability in the refractive index of the resultant niobium oxide film can be suppressed to ≤1%. Moreover, manufacturability can be improved by using hot extrusion. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
