发明名称 POSITIVE PHOTOSENSITIVE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide an alkali-soluble positive photosensitive composition having sensitivity to laser light in IR wavelength region and to provide a positive photosensitive composition from which sufficient adhesiveness is obtained when the composition is applied under the condition of 25 to 60% humidity in a work room without requiring burning, development without producing residue is carried out while keeping high sensitivity, a sharp profile is obtained and an extremely hard resist film is obtained to improve scratch resistance for handling before development. <P>SOLUTION: The positive photosensitive composition comprises an alkali-soluble organic polymer substance having a phenolic hydroxyl group, a photothermal converting substance which absorbs IR rays from an image exposure light source to convert into heat, and polyvinyl formal resin. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004184548(A) 申请公布日期 2004.07.02
申请号 JP20020348975 申请日期 2002.11.29
申请人 THINK LABORATORY CO LTD 发明人 SATO TSUTOMU
分类号 G03F7/032;G03F7/00;G03F7/004 主分类号 G03F7/032
代理机构 代理人
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