| 摘要 |
PROBLEM TO BE SOLVED: To provide a metal mask which can form a highly precise pattern film when used as a metal mask for vapor deposition in manufacturing an organic EL display or the like. SOLUTION: The metal mask comprises an aperture-forming layer for determining an aperture dimension, a supporting layer, and a bonding layer which is sandwiched by the above aperture forming layer and the supporting layer and has different etching characteristics from the above aperture-forming layer and the supporting layer, wherein the above aperture-forming layer and supporting layer are made from an Fe-Ni alloy comprising, by mass%, 30-55% Ni+Co, 0.01% or less C and the balance substantially Fe; and the Fe-Ni alloy used in the aperture-forming layer and supporting layer has preferably (200) so as to occupy 60-99% in the main orientations of (111), (200), (311) and (220). COPYRIGHT: (C)2004,JPO&NCIPI
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