发明名称 THIN FILM FORMATION METHOD BY LASER ABRASION, AND SYSTEM THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a thin film formation method where a protective thin film for protecting a silica glass tubular material composing a high-intensity discharge lamp (HID lamp) belonging to a lighting field from the plasma of a metal halogen compound, mercury or the like being luminescent materials is formed by laser abrasion. SOLUTION: In the thin film formation method by laser abrasion, when a laser beam is applied from the outside of a transparent material body 1 such as a glass tube or a glass tube ball, and is condensed on a target inside the transparent material body, the beam size is once expanded by a beam expander, and it is condensed on the target 2 using a lens having an f value of <1 such as an aspherical condenser lens and a Fresnel lens 6 to form a thin film inside the transparent material body. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004183069(A) 申请公布日期 2004.07.02
申请号 JP20020353413 申请日期 2002.12.05
申请人 JAPAN SCIENCE & TECHNOLOGY AGENCY;MASUNAGA OPTICAL MFG CO LTD 发明人 UMEDA TATSUO
分类号 C03C17/245;C23C14/28;H01J9/20;(IPC1-7):C23C14/28 主分类号 C03C17/245
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