发明名称 MANUFACTURING METHOD FOR CATHODE SUBSTRATE FOR FED
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for easily manufacturing a cathode substrate for FED. <P>SOLUTION: In this manufacture method for a cathode substrate for FED having at least a cathode electrode layer 22, an insulating layer 24, a gate electrode layer 25 and a carbon-based emitter growth catalyst layer 23, the carbon-based emitter growth catalyst layer is formed before the insulating layer 24 and the gate electrode layer 25 are formed. The film thickness of the catalyst layer 23 is 1 nm to 50 nm, and the catalyst layer is made of Fe, Co or an alloy including at least one kind of these metals. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p>
申请公布号 JP2004186015(A) 申请公布日期 2004.07.02
申请号 JP20020352324 申请日期 2002.12.04
申请人 ULVAC JAPAN LTD 发明人 HIRAKAWA MASAAKI;MURAKAMI HIROHIKO;MIURA OSAMU;ONO KAZUNAO
分类号 H01J9/02;(IPC1-7):H01J9/02 主分类号 H01J9/02
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