| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming device that forms a pattern with a proper sectional shape on a substrate by suppressing the surface tension of a pattern forming material directly after discharge. <P>SOLUTION: A pattern forming device 1 is equipped with a stage 3 which holds a substrate 9 in a slanting state and a head part 4 having a discharge part 42 for discharging the pattern forming material onto the substrate 9. The stage 3 moves through a stage moving mechanism 2 along the main surface of the substrate 9. When a pattern is formed, the substrate 9 moves to below the discharge part 42 first, and mixed liquid of ethanol and water is supplied onto the substrate 9 and is held on the substrate 9 while keeping in contact with the discharge hole of the discharge part 42. The stage 3 is moved while the pattern forming material is being discharged from the discharge part 42, the surface tension of the pattern forming material directly after discharge is decreased with the mixed liquid, and a barrier pattern 91 is formed on the substrate in a sectional shape corresponding to the shape of the discharge hole of the discharge part 42. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
