发明名称 GAS SPRAYER FOR POLLUTED GAS PURIFICATION APPARATUS
摘要 PURPOSE: A gas sprayer for polluted gas purification apparatus is provided to maximize purification efficiency by selecting an injection direction of contaminated gas ejected into the purification apparatus in such a way that bubbles are eliminated and reduce scale of the purification apparatus by reducing bubble elimination distance of the polluted gas. CONSTITUTION: In a polluted gas purification apparatus comprising a cylindrical water tank in which purification solution is rotated in vortex, solution injection pipes(30) set up in the cylindrical water tank to inject the purification solution, and a plural polluted gas injection pipes(50) installed between the solution injection pipes, the gas sprayer for the polluted gas purification apparatus is characterized in that the polluted gas injection pipes(50,50a,50b) are arranged in multistage on the vertical plane, and a plural injection nozzles are installed on the same horizontal plane as an injection direction of the solution injection pipes in such a manner that one lower inclination nozzle(60) is attached to the polluted gas injection pipes, a plural downward inclination nozzles(70a,70b) are attached to intermediate polluted gas injection pipes(50a), and upper inclination nozzle(80a) and horizontal injection nozzle(80b) are attached to lower polluted gas injection pipes(50b).
申请公布号 KR20040057386(A) 申请公布日期 2004.07.02
申请号 KR20020084104 申请日期 2002.12.26
申请人 ANICO CO., LTD. 发明人 LIM, JEONG CHAE;LIM, JEONG HONG;YOON, YEONG CHEOL
分类号 B01D47/02;(IPC1-7):B01D47/02 主分类号 B01D47/02
代理机构 代理人
主权项
地址