| 摘要 |
PURPOSE: A lithographic apparatus and a device manufacturing method are provided to configure and revise an intensity distribution of a beam on a pupil plane. CONSTITUTION: A lithographic apparatus includes an illumination system, a support structure, and a substrate table. The illumination system provides a projection beam of radiation(PB) and includes a first optical element(120a) constructed and arranged to deflect the projection beam over a first range of directions with a direction dependent intensity distribution. The lithographic apparatus further includes a second optical element(120b) and a blocking element. Each of the first optical element and the second optical element is arranged to pass a major portion of the projection beam substantially without deflection. The second optical element deflects a portion of the major portion of the projection beam passed by the first optical element over a second range of directions . The blocking element blocks transmission to the substrate of the part of intensity of the projection beam passed undeflected by both the optical element and the second optical element.
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