METHOD FOR MANUFACTURING TaON CAPACITOR

摘要

PURPOSE: A method for manufacturing a capacitor is provided to increase capacitance and to shorten annealing time by forming a TaON film as a dielectric film using PEALD(Plasma Enhanced Atomic Layer Deposition). CONSTITUTION: A lower electrode(31a) is formed on a semiconductor substrate(11) and treated by NH3 plasma treatment. A TaON film(35) as a dielectric film is formed on the lower electrode by PEALD. An upper electrode(39) is then formed on the TaON film.