发明名称 METHOD FOR MEASURING OVERLAY
摘要 PURPOSE: An overlay measurement method is provided to improve overlay accuracy by constantly maintaining the distance between an overlay object layer and an overlay target using automatic focusing function of a sensor. CONSTITUTION: Each distance between an overlay object layer(4) and an overlay target(2) is sensed at each measuring position by using a sensor with automatic focusing function. The sensing signal transports to a stage motor. A stage of an overlay measuring unit compensates to +Z or -Z axis direction, thereby constantly maintaining the distance.
申请公布号 KR20040057627(A) 申请公布日期 2004.07.02
申请号 KR20020084394 申请日期 2002.12.26
申请人 HYNIX SEMICONDUCTOR INC. 发明人 KIM, MUN HOE
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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