发明名称 SPUTTERING TARGET FOR FORMING PROTECTIVE FILM OF OPTICAL RECORDING MEDIUM WHICH ENABLES HIGH-SPEED SPUTTERING
摘要 <P>PROBLEM TO BE SOLVED: To provide a sputtering target for forming a protective film of an optical recording medium, which is made of a zinc sulfide-silicon dioxide sintered compact and can perform high-speed sputtering, and its manufacturing method. <P>SOLUTION: The sputtering target for forming the protective film of the optical recording medium is the sintered compact which has a composition comprising 10-30 atomic% silicon dioxide, 0.01-10 atomic% argon, nitrogen or a mixture thereof and the balance being zinc sulfide. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004183083(A) 申请公布日期 2004.07.02
申请号 JP20020354950 申请日期 2002.12.06
申请人 MITSUBISHI MATERIALS CORP 发明人 MASHIMA MUNETAKA;SHIRAI TAKANORI
分类号 C04B35/547;C23C14/34;G11B7/24;G11B7/254;G11B7/257;G11B7/26 主分类号 C04B35/547
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