发明名称 |
SPUTTERING TARGET FOR FORMING PROTECTIVE FILM OF OPTICAL RECORDING MEDIUM WHICH ENABLES HIGH-SPEED SPUTTERING |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sputtering target for forming a protective film of an optical recording medium, which is made of a zinc sulfide-silicon dioxide sintered compact and can perform high-speed sputtering, and its manufacturing method. <P>SOLUTION: The sputtering target for forming the protective film of the optical recording medium is the sintered compact which has a composition comprising 10-30 atomic% silicon dioxide, 0.01-10 atomic% argon, nitrogen or a mixture thereof and the balance being zinc sulfide. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
申请公布号 |
JP2004183083(A) |
申请公布日期 |
2004.07.02 |
申请号 |
JP20020354950 |
申请日期 |
2002.12.06 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
MASHIMA MUNETAKA;SHIRAI TAKANORI |
分类号 |
C04B35/547;C23C14/34;G11B7/24;G11B7/254;G11B7/257;G11B7/26 |
主分类号 |
C04B35/547 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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