PATTERN INSPECTION APPARATUS, PATTERN INSPECTION METHOD, AND RECORDING MEDIUM

摘要

PROBLEM TO BE SOLVED: To perform inspection by comparing the objective pattern image for inspection with a referential pattern in real time.

SOLUTION: A first edge is detected from the image of the objective pattern for inspection. The first edge is compared with the edge of a first referential pattern to match the objective pattern image for inspection with the referential pattern. The obtained shift amount S1is used to shift the first referential pattern. The objective pattern is inspected by comparing the first edge with the shifted edge of the first referential pattern. A shift amount S2is obtained as one of pattern deformation quantities. A second referential pattern is shifted by the total shift amount of S1+S2. The profile on the objective pattern image is obtained by using the second referential pattern to detect a second edge. The second edge is compared with the edge of the shifted second referential pattern to inspect the objective pattern. Thus, a shift amount S3is obtained as one of pattern deformation quantities.

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