| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the accuracy of a judgment on the state of operation of an apparatus and the state of a treatment of an object to be treated. <P>SOLUTION: An emission spectrum of light which is emitted from plasma during a plasma treatment for a wafer is obtained by an optical measuring instrument 120 as optical data. Quantitative data of each emission type is found from the obtained optical data by using reference data of each emission type from a database 206 which stores emission spectra of the several types of emission as reference data. Then quantitative data of each emission type is monitored and the state of operation of the plasma treating apparatus and the state of treatment of the wafer is judged according to the change in quantitative data of each type of emission. In this way, the state of operation of the plasma treating apparatus and the state of treatment of the wafer can be judged according to the emission spectrum of plasma which is formed of a wide range of wavelength bands. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
