| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a device and a method for exposure which are capable of effecting high dignity exposure by detecting a foreign matter on a reticle or a reticle stage, and a manufacturing method of a device employing such an aligner, and a foreign matter existence deciding device. <P>SOLUTION: The aligner for transferring a pattern formed on the reticle supported by a reticle stage to a body to be exposed employing a projection optical system is provided with a measuring means for measuring a height in the direction of an optical axis with respect to the reference position of a predetermined position of the reticle, and a deciding means for deciding the existence of the foreign matter on the reticle stage or the reticle by comparing height information showing the height measured by the measuring means with a reference value. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
