发明名称 METHOD FOR FORMING BORON NITRIDE FILM AND FILM FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a boron nitride film with a low specific dielectric constant and an excellent metal spread preventing function. SOLUTION: A high frequency antenna 7 and a high frequency power supply 9 apply plasma processing to ammonium gas 11 mainly introduced to a film forming chamber 2 to generate plasma 10 in the film forming chamber 2, and to react diborane gas introduced to the film forming chamber 2 with the plasma-processed ammonium gas, and controlling the temperature of the board 6 forms the boron nitride film 15 having a low specific dielectric constant and an excellent metal spread preventing function onto the board 6. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004186403(A) 申请公布日期 2004.07.02
申请号 JP20020351251 申请日期 2002.12.03
申请人 MITSUBISHI HEAVY IND LTD 发明人 KATO MASAHIRO;SHIMAZU TADASHI;NISHIMORI TOSHIHIKO
分类号 C23C16/38;H01L21/318;H01L21/768;H01L23/522;(IPC1-7):H01L21/318 主分类号 C23C16/38
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