发明名称 |
MODELING DEVICE AND MODEL ANALYSIS METHOD, SYSTEM AND METHOD FOR PROCESS ABNORMALITY DETECTION/CLASSIFICATION, MODELING SYSTEM, AND MODELING METHOD, AND FAILURE PREDICTING SYSTEM AND METHOD OF UPDATING MODELING APPARATUS |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a modeling apparatus that can easily make a model of correlation between process data and result data in a semiconductor manufacturing process. <P>SOLUTION: The modeling apparatus acquires time series process data by collecting such process condition data in a constant cycle that is obtained when the process is performed, and it extracts a process characteristic quantity from the process data by a process data editing part 10a and stores it in a process characteristic quantity data storage 10i. The ID of a product is used as a key, the process characteristic quantity data, a test data and a failure data are combined, and data for analysis that are generated by deleting invalid data in a data filter 10c is analyzed through data mining by an analysis part 10d to create a model. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
申请公布号 |
JP2004186445(A) |
申请公布日期 |
2004.07.02 |
申请号 |
JP20020351850 |
申请日期 |
2002.12.03 |
申请人 |
OMRON CORP |
发明人 |
OGAWA MINORU;NAKAMURA JUICHI;AIKAWA TEIICHI |
分类号 |
H01L21/02;G05B13/04;G05B23/02;(IPC1-7):H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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