RETICLE STAGE AND EXPOSURE APPARATUS INCLUDING THE SAME

摘要

PURPOSE: A reticle stage and an exposure apparatus including the same are provided to prevent the light passed through a reticle from being scattered and refracted to a photoresist pattern due to the reflection of an inner wall of the reticle stage by forming the reticle stage using beam penetration material and forming a tilted surface on the inner wall. CONSTITUTION: A reticle(180) is used for selectively supplying light to a substrate. A reticle stage(150) includes a plate(100) made of beam penetration material for supporting the reticle. The plate has an opening portion(110) and an inner wall(130b). The reticle stage further includes a light shielding layer(120) on the first surface of the plate for blocking unwanted light. The size of the opening portion is smaller than the reticle. Preferably, the inner wall has a tilted surface.