SYSTEM FOR AUTOMATICALLY CONTROLLING FLOW RATE IN SEMICONDUCTOR WET EQUIPMENT AND CONTROL METHOD THEREOF

摘要

PURPOSE: A system for automatically controlling flow rate in semiconductor wet equipment and a control method thereof are provided to be capable of compensating chemicals for the decrease of flow rate due to the clogging of a filter. CONSTITUTION: A system for automatically controlling flow rate in semiconductor wet equipment is provided with a filter(3), a flowmeter(4) connected with the filter for measuring the flow rate of chemicals, and a PLC(Programmable Logic Controller)(7) for generating control data by comparing the flow rate data supplied from the flowmeter with reference data for the flow rate. The system further includes a pump(2) and an inverter(8) for compensating chemicals for the reduction of flow rate by supplying the control data to the pump.