发明名称 |
Liquid crystal display substrate fabrication |
摘要 |
In order to prevent exposure mismatch on a boundary between exposure regions that causes pattern connection defects (including stitch defects), exposure is performed twice or more on a whole exposure region of a glass substrate. The exposure method includes aligning a reticle in a scanning direction, exposing the reticle pattern onto the glass substrate, moving the glass substrate one-half of the width of the reticle, and exposing an exposure area twice by repeating the exposing and moving steps.
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申请公布号 |
US2004125331(A1) |
申请公布日期 |
2004.07.01 |
申请号 |
US20030723491 |
申请日期 |
2003.11.25 |
申请人 |
LG. PHILIPS LCD CO., LTD. |
发明人 |
PARK SOON-YOUNG;LEE DEOK-WON |
分类号 |
G03F7/22;G03F7/20;(IPC1-7):G02F1/13 |
主分类号 |
G03F7/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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