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发明名称
Verfahren zur Herstellung einer Halbleiterstruktur mit einer auf Silizium stabilen kristallinen Zwischenschicht
摘要
申请公布号
DE60011022(D1)
申请公布日期
2004.07.01
申请号
DE2000611022
申请日期
2000.12.11
申请人
MOTOROLA, INC.
发明人
YU, ZHIYI JIMMY;WANG, JUN;DROOPAD, RAVINDRANATH;RAMDANI, JAMAL
分类号
H01L21/20;C30B23/02;H01L21/02;H01L21/314;H01L21/316;H01L21/318;H01L21/8246;H01L27/105
主分类号
H01L21/20
代理机构
代理人
主权项
地址
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