OZONE-PROCESSING APPARATUS

摘要

An ozone-processing apparatus for uniformly and efficiently processing a substrate by uniformly supplying an ozone-containing process gas onto a surface of the substrate is disclosed. This ozone-processing apparatus (1) comprises a stage (20) on which a substrate (K) is placed, a heater for heating the substrate (K), a process gas supply head (30) which is so arranged above the stage (20) as to face the substrate placed on the stage (20) and discharges an ozone-containing process gas onto the substrate (K), and a gas supply unit (53) for feeding the process gas to the process gas supply head (30). The process gas supply head (30) is composed of a case member (37) having a gas holding chamber (45) with a certain internal volume. The case member (37) has an opening in the bottom facing the substrate (K), and this opening is occluded with a platelike air-permeable member (40) which has many penetrating air passages across the entire body. The process gas fed from the gas supply unit (53) is filled into the gas holding chamber (45), and then discharged through the air passages of the air-permeable member (40).