发明名称 |
Stage apparatus, exposure apparatus, and semiconductor device manufacturing method |
摘要 |
A stage apparatus is a stage apparatus having a substrate holding unit which chucks and holds a substrate, and includes a flat surface having a recess where the substrate holding unit is to be mounted, and a fixing member which fixes a projection support provided to the substrate holding unit onto the flat surface. The substrate holding unit is supported by the fixing member while a distal end of the projection support is in contact with the recess of the flat surface and the remaining portion of the substrate holding unit is not in contact with the flat surface.
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申请公布号 |
US2004124594(A1) |
申请公布日期 |
2004.07.01 |
申请号 |
US20030704638 |
申请日期 |
2003.11.12 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
MUTO YASUYO;IWAMOTO KAZUNORI;TAKABAYASHI YUKIO;MEGURO TAKASHI |
分类号 |
H01L21/683;H01L21/027;H01L21/68;H01L21/687;(IPC1-7):B23B31/28 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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