CHEMICAL AMPLIFICATION TYPE SILICONE BASE POSITIVE PHOTORESIST COMPOSITION

摘要

A chemical amplification type silicone base positive resist composition that can be produced from easily procurable compounds as raw materials through simple means and can provide a bilayer resist material from which fine pattern of high resolution, high aspect ratio, desirable sectional morphology and low line edge roughness can be formed. In particular, a chemical amplification type positive resist composition comprising alkali soluble resin (A) and photoacid generator (B) wherein a ladder type silicone copolymer comprising (hydroxyphenylalkyl)silsesquioxane units (a1), (alkoxyphenylalkyl)silsesquioxane units (a2) and alkyl- or phenylsilsesquioxane units (a3) is used as the alkali soluble resin (A). The copolymer wherein in the component (A), the units (a3) are phenylsilsesquioxane units is a novel compound.