| 摘要 |
The present invention provides a wafer center calibrator to improve the uniformity of the etching, or deposition on a wafer, which is spoiled by the poor assembly of the focus ring with the wafer loader. Thus comprising of a main part, at least one arc part, a handle or any other means by which the calibrator is rotated a round. To use the wafer center calibrator provided by the present invention, at least one arc part is placed into the ring-shaped gap formed between the focus ring and the wafer loader, then the wafer center calibrator is rotated around by a user or any other means. At least one arc part rubs against the focus ring and pushes through where the ring-shaped gap is narrower. Meanwhile, the calibration is rapid and simple, therefore the improvement of the uniformity of the etching or deposition on the wafer can be made in an economical and effective way.
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