发明名称 |
Method for modifying the surface of a polymeric substrate |
摘要 |
A process for modifying the surface of a polymeric substrate. The process includes digitally applying a photoreactive material comprising at least one photochemical electron donor to a region of a polymeric substrate and exposing at least a portion of that region to actinic radiation. The modified surface of the polymeric substrate may be bonded to one or more additional substrates, or may be coated with a fluid.
|
申请公布号 |
US2004126708(A1) |
申请公布日期 |
2004.07.01 |
申请号 |
US20020335494 |
申请日期 |
2002.12.31 |
申请人 |
3M INNOVATIVE PROPERTIES COMPANY |
发明人 |
JING NAIYONG;WRIGHT BRADFORD B.;YLITALO CAROLINE M. |
分类号 |
B05D3/06;B05D5/00;B05D7/02;G03F7/004;H05K3/12;H05K3/38;(IPC1-7):C08J3/28;G03C1/76;G03C5/00 |
主分类号 |
B05D3/06 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|