发明名称 Method for modifying the surface of a polymeric substrate
摘要 A process for modifying the surface of a polymeric substrate. The process includes digitally applying a photoreactive material comprising at least one photochemical electron donor to a region of a polymeric substrate and exposing at least a portion of that region to actinic radiation. The modified surface of the polymeric substrate may be bonded to one or more additional substrates, or may be coated with a fluid.
申请公布号 US2004126708(A1) 申请公布日期 2004.07.01
申请号 US20020335494 申请日期 2002.12.31
申请人 3M INNOVATIVE PROPERTIES COMPANY 发明人 JING NAIYONG;WRIGHT BRADFORD B.;YLITALO CAROLINE M.
分类号 B05D3/06;B05D5/00;B05D7/02;G03F7/004;H05K3/12;H05K3/38;(IPC1-7):C08J3/28;G03C1/76;G03C5/00 主分类号 B05D3/06
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