| 发明名称 |
DELIBERATE SEMICONDUCTOR FILM VARIATION TO COMPENSATE FOR RADIAL PROCESSING DIFFERENCES, DETERMINE OPTIMAL DEVICE CHARACTERISTICS, OR PRODUCE SMALL PRODUCTIONS |
| 摘要 |
Methods and apparatuses are disclosed that can introduce deliberate semiconductor film variation during semiconductor manufacturing to compensate for radial processing differences, to determine optimal device characteristics, or produce small production runs. The present invention radially varies the thickness and/or composition of a semiconductor film to compensate for a known radial variation in the semiconductor film that is caused by performing a subsequent semiconductor processing step on the semiconductor film.
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| 申请公布号 |
US2004127060(A1) |
申请公布日期 |
2004.07.01 |
| 申请号 |
US20040707937 |
申请日期 |
2004.01.27 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
FURUKAWA TOSHIHARU;HAKEY MARK C.;HOLMES STEVEN J.;HORAK DAVID V. |
| 分类号 |
C23C16/04;C23C16/513;C23C16/52;H01L21/3105;H01L21/311;H01L21/3213;H01L21/66;H01L21/762;H01L21/8234;(IPC1-7):H01L21/31 |
主分类号 |
C23C16/04 |
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