发明名称 SEMICONDUCTOR MATERIAL HAVING BIPOLAR TRANSISTOR STRUCTURE AND SEMICONDUCTOR DEVICE USING SAME
摘要 <p>An epitaxial substrate (20) having a collector layer (22), a base layer (23) and an emitter layer (24) formed on a semi-insulating GaAs substrate (21) further comprises a hole blocking layer (22C) which is formed in the collector layer (22) for preventing flow-in of holes from the base layer (23). With this structure, a collector current flow is suppressed when the electron speed is saturated due to a rise in the collector current density, thereby preventing a thermal runaway of the collector current without using a ballast resistor or the like. The thermal runaway of the collector current can be also prevented by providing an additional layer (2C) in the collector layer (2) so that an electron barrier is formed in a conduction band with electrons accumulated due to a rise in the collector current density.</p>
申请公布号 WO2004055903(A1) 申请公布日期 2004.07.01
申请号 WO2003JP16082 申请日期 2003.12.16
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED;INOUE, AKIRA;HATA, MASAHIKO;KURITA, YASUYUKI 发明人 INOUE, AKIRA;HATA, MASAHIKO;KURITA, YASUYUKI
分类号 H01L21/331;H01L29/08;H01L29/737;(IPC1-7):H01L29/737 主分类号 H01L21/331
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