发明名称 Planarizers for spin etch planarization of electronic components and methods of use thereof
摘要 An electronic component contemplated comprises a) a substrate layer, b) a dielectric layer coupled to the substrate layer, c) a barrier layer coupled to the dielectric layer, d) a conductive layer coupled to the barrier layer, and e) a protective layer coupled to the conductive layer. The electronic component contemplated herein can be produced by a) providing a substrate; b) coupling a dielectric layer to the substrate; c) coupling a barrier layer to the dielectric layer; d) coupling a conductive layer to the barrier layer; and e) coupling a protective layer to the conductive layer. The protective layer may then be cured to a desirable hardness. A method of planarizing a conductive surface of an electronic component may comprise a) introducing or coupling a protective layer onto a conductive layer; b) dispersing the protective layer across the conductive layer; c) curing the protective layer; d) introducing an etching solution onto the conductive layer; and e) etching the conductive surface to substantial planarity.
申请公布号 US2004124438(A1) 申请公布日期 2004.07.01
申请号 US20030444700 申请日期 2003.05.22
申请人 MUKHERJEE SHYAMA;LEVERT JOSEPH;BEBEAR DONALD 发明人 MUKHERJEE SHYAMA;LEVERT JOSEPH;BEBEAR DONALD
分类号 H01L21/321;H01L21/768;H01L23/532;H01L31/109;(IPC1-7):H01L31/109 主分类号 H01L21/321
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