发明名称 Micro inertia sensor and method of manufacturing the same
摘要 The present invention provides a micro inertia sensor and a method of manufacturing the same, the micro inertia sensor includes a lower glass substrate; a lower silicon including a first border, a first fixed point and a side movement sensing structure; an upper silicon including a second border, a second fixed point being connected to a via hole, in which a metal wiring is formed, on an upper side, and an sensing electrode, which correspond to the first border, the first fixed point and the side movement sensing structure; a bonded layer by a eutectic bonding between the upper silicon and the lower silicon; and a upper glass substrate, being positioned on an upper portion of the upper silicon, for providing the via hole on which an electric conduction wiring is formed, thereby aiming at the miniaturization of the product and the simplification of the process.
申请公布号 US2004126920(A1) 申请公布日期 2004.07.01
申请号 US20030735171 申请日期 2003.12.12
申请人 AN SEUNG DO;KIM KYOUNG SOO;CHO JI MAN 发明人 AN SEUNG DO;KIM KYOUNG SOO;CHO JI MAN
分类号 G01P9/04;B81B3/00;B81C1/00;G01C19/56;G01P1/02;G01P15/08;G01P15/125;H01L29/84;(IPC1-7):H01L21/00 主分类号 G01P9/04
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