| 摘要 |
An X-ray mask has a mask pattern, a protection means for forming a dust-proof space for protecting the mask pattern, and an inner atmospheric pressure adjustment hole for ventilating between the dust-proof space and the outer atmosphere. The X-ray mask can be either a transmission type mask in which the mask pattern is formed on a membrane, or a reflection type mask in which a multilayered film reflection layer and the mask pattern are formed on a substrate.
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