发明名称 |
CHEMICAL-AMPLIFICATION-TYPE POSITIVE RADIATION-SENSITIVE RESIN COMPOSITION |
摘要 |
In a positive-working chemically amplified radiation sensitive resin composition with high sensitivity and high resolution comprising an alkali-insoluble or slightly alkali-soluble resin protected with an acid-labile protecting group and an acid generating compound upon irradiation with radiation, a difference of resolution line widths of isolated and dense patterns in a circuit pattern, in which an isolated pattern and a dense pattern are mixed, can be reduced by using a resin having activation energy ( DELTA E) to make the protecting group cleaved of 25 Kcal/mole or higher as the alkali-insoluble or slightly alkali-soluble resin protected with an acid-labile protecting group, and a mixture of a compound generating a carboxylic acid upon irradiation with radiation and a compound generating a sulfonic acid upon irradiation with radiation as the acid generator.
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申请公布号 |
EP1434091(A1) |
申请公布日期 |
2004.06.30 |
申请号 |
EP20020800236 |
申请日期 |
2002.09.24 |
申请人 |
CLARIANT INTERNATIONAL LTD. |
发明人 |
HAMADA, TAKAHIRO;LEE, DONG KWAN;MIYAZAKI, SHINJI |
分类号 |
G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 |
主分类号 |
G03F7/004 |
代理机构 |
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主权项 |
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地址 |
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