| 摘要 |
This invention comprises a lithographic projection apparatus for imaging a mask pattern in a mask onto a substrate, the apparatus comprising a radiation system constructed and arranged to supply a projection beam of radiation; a first object table constructed to hold a mask; a second object table constructed to hold a substrate; and a projection system constructed and arranged to image an irradiated portion of the mask onto a target portion of the substrate; characterized in that it comprises an electrode (9) for applying an electric field between the radiation source (LA) and the electrode (9) and to generate an extra discharge between the radiation source and the electrode. This field that is applied in the apparatus of the invention removes undesirable contaminants (debris) produced by the radiation source. <IMAGE>
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