发明名称 Method for removing organic compound by ultraviolet radiation and apparatus therefor
摘要 An organic polymer film can be completely decomposed and removed from a substrate surface by exposing the film to ultraviolet radiation having a wavelength of 180 nm or less. Also, ultraviolet radiation not longer than 180 nm in wavelength is scarcely transmitted through a transparent conductive oxide such as ITO and, thus, can be used for eliminating a defective polyimide alignment film formed on a color filter substrate and an array substrate having a transparent electrode pattern of ITO formed on the surface of a pigment portion and a TFT structure, respectively. According to the present invention, the defective alignment film on the substrates can be removed completely without any damage such as discoloring of the pigment portion and/or changing the TFT characteristics.
申请公布号 US6756087(B2) 申请公布日期 2004.06.29
申请号 US20020188268 申请日期 2002.07.02
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 TERADA KAZUO
分类号 G02B5/20;G02F1/1337;(IPC1-7):B05D3/06 主分类号 G02B5/20
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