发明名称 Thermal generation of mask pattern
摘要 A mask having a first region and a second region; the first region having a multilayer mirror over a substrate, the multilayer mirror having alternating layers of a first material and a second material, the first material having a high index of refraction, the second material having a low index of refraction; and the second region having a compound of the first material and the second material over the substrate.
申请公布号 US6756158(B2) 申请公布日期 2004.06.29
申请号 US20010895739 申请日期 2001.06.30
申请人 INTEL CORPORATION 发明人 YAN PEI-YANG
分类号 G03F1/00;G03F1/14;(IPC1-7):G03F9/00;G03C5/00 主分类号 G03F1/00
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