| 摘要 |
PURPOSE: Provided is an exhaust gas treating system which is able to keep the same inlet pressure when using an auxiliary exhaust route instead of using a main exhaust route. CONSTITUTION: The exhaust gas treating system(200) comprises a canister(220) filled with a first resin reacting with exhaust gas generated from a semiconductor device manufacturing process to filter poisonous foreign matters in the exhaust gas, a first exhaust line(210) connected to the canister and guiding the exhaust gas in the canister, a second exhaust line(230) connected to the canister, discharging the filtered exhaust gas to the outside and having a flow rate controller(240) to control the discharge rate of the exhaust gas and a third exhaust line(260) branched off from the first exhaust line and connected to the second exhaust line to make the exhaust be discharged after passing through the flow rate controller when changing the canister.
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