LITHOGRAPHY APPARATUS COMPRISING ALIGNMENT SUBSYSTEM, PREPARATION METHOD OF DEVICE USING ALIGNING AND ALIGNMENT STRUCTURE TO IMPROVE CAPTURE RANGE OF PERIODIC ALIGNMENT SYSTEM AND ROBUSTNESS

摘要

PURPOSE: Provided are a lithography apparatus comprising an alignment subsystem, a method for preparing a device and an alignment structure to improve the capture range of a periodic alignment system and robustness. CONSTITUTION: The lithography apparatus comprises a supporting structure which supports the patterning means patterning the projected beam of radiation according to a desired pattern; a substrate table which holds a substrate(W) provided with an alignment structure having spatially periodic optical properties; and an alignment subsystem(21) which aligns the substrate to the pattern means, wherein the alignment subsystem(21) comprises an optical device(20, 24, 26) which optically treats the light reflected from the alignment structure or transmitted by the alignment structure to produce a measuring light whose intensity is changed according to the reference position defined to the patterning means and the relative position of the spatially periodic alignment structure; a sensor which is connected with an optical interference device for measuring the intensity of measuring light and/or the information of phase; and an actuator(PW) which controls the relative position of the patterning means and the substrate table based on the intensity of measuring light and/or the information of phase. The alignment subsystem is aligned so as to use an aperiodic pitcher provided on the alignment structure detectable as a capture position or a check position.