发明名称 SYSTEM AND METHOD FOR CLEANING SURFACE PARTICLES OF COMPONENT IN LITHOGRAPHIC PROJECTION DEVICE FOR PREVENTING DEGRADATION OF OPTICAL PROPERTIES OF OPTICAL COMPONENTS, LITHOGRAPHIC PROJECTION DEVICE, AND MANUFACTURING METHOD OF DEVICE
摘要 PURPOSE: Provided are a system and a method for cleaning the surface of a component in a lithographic projection device, which remove particles in the vicinity of the surface to prevent degradation of optical properties. CONSTITUTION: The system(100) for removing contaminants(105) from at least a part of the surface(104) of component in a lithographic projection device comprises a cleaning particle supplier for cleaning particles in the vicinity of the surface of the component in the lithographic projection device. The cleaning particle supplier includes an electric field generator for generating an electric field(107). The system may further comprise an adjusting unit connected and communicated with the electric field generator for controlling at least one property of the electric field.
申请公布号 KR20040055694(A) 申请公布日期 2004.06.26
申请号 KR20030093948 申请日期 2003.12.19
申请人 ASML NETHERLANDS B.V.;CARL ZEISS SMT AG 发明人 BAKKER LEVINUS PIETER;KURT RALPH;MERTENS BASTIAAN MATTHIAS;WEISS MARKUS;TRENKLER JOHANN;SINGER WOLFGANG
分类号 G03F7/30;B08B6/00;B08B7/00;G03F7/20;H01L21/027;(IPC1-7):G03F7/30 主分类号 G03F7/30
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