| 摘要 |
A halftone phase shift mask blank comprising a light transmission portion for allowing exposure light to transmit, a phase shifter portion for shifting the phase of the light transmitted by predetermined quantity simultaneously when a part of the exposure light is transmitted, and a phase shifter film for forming the phase shifter portion, and used for manufacturing a halftone phase shift mask having such optical characteristics that the light transmitted through the light transmission portion and the light transmitted through the phase shifter portion are canceled by each other in the vicinity of a boundary thereof, and capable of maintaining and improving excellent contrast of an exposure light pattern boundary transferred on to a surface of a body to be exposed. The phase shifter film comprises a film mainly consisting of silicon, oxygen and nitrogen, and an etching stopper film formed between the film and a transparent substrate. |
