| 摘要 |
A thermal treatment apparatus includes a furnace of a refractory, a stage capable of carrying synthetic silica glass and moving between a first stage position for letting the synthetic silica glass into the furnace and a second stage position for letting the synthetic silica glass out of the furnace, a heat generator for heating the synthetic silica glass, and a driving section connected to the stage, for moving the stage between the first stage position and the second stage position. The thermal treatment apparatus also can include a rotational driving section for rotating the stage.
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