发明名称 MAGNETIC TUNNEL JUNCTION ELEMENT AND MANUFACTURING METHOD THEREFOR
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a high-performance magnetic tunnel junction element, and its manufacturing method, that combines a magnetic resistance buffer layer having a stated thickness with a tunnel barrier layer for improved homogeneity, thus obtaining a high MR (Magnetoresistance) ratio and a low RA (Resistance Area) value. <P>SOLUTION: The magnetic tunnel junction element, which has a substrate 11, fixed beds 12, 13, and 15 laminated in sequence on the substrate, a tunnel barrier layer 19, and a free bed 21, is provided with a magnetoresistance buffer layer 17, made of a metal nitride, between the fixed beds 12, 13, and 15, and the tunnel barrier layer 19, and is heat-treated as a whole, thus having reduced magnetic junction resistance. Further, the manufacturing method for the junction element is also included in this invention. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004179652(A) 申请公布日期 2004.06.24
申请号 JP20030386883 申请日期 2003.11.17
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 KIM TAE-WAN;CHO BEONG-KI;SHIM HEE-JAE
分类号 G11B5/39;G11C11/15;H01F10/14;H01F10/16;H01F10/32;H01F41/30;H01L43/08;H01L43/12;(IPC1-7):H01L43/08 主分类号 G11B5/39
代理机构 代理人
主权项
地址