| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a polishing liquid by which a metal for a wiring section is not corroded, a surface to be polished having flatness is obtained even when the surface to be polished is composed of a plurality of substances and a metallic residue and a polishing flaw after a polishing can be inhibited, and a method for a chemical-mechanical polishing by using the polishing liquid. <P>SOLUTION: The polishing liquid contains at least one kind selected from an aromatic sulfonic acid or an aromatic sulfonic acid salt, at least one kind selected from an aromatic carboxylic acid or an aromatic carboxylic acid salt and water, preferably comprises each of the aromatic sulfonic acid or the aromatic sulfonic acid salt and the aromatic carboxylic acid or the aromatic carboxylic acid salt of 0.001 to 5 wt.%, and each content ratio is set in 1:0.01 to 1:100. <P>COPYRIGHT: (C)2004,JPO</p> |
