| 摘要 |
PROBLEM TO BE SOLVED: To obtain a mold for molding an optical device having a microstructure of an optical waveguide or the like with high accuracy. SOLUTION: After an excess amount of a resist liquid 10a is applied on a silicon substrate 1 having a frame-like barrier 2 on the peripheral edge, the bulging resist liquid film 10 is squeezed almost parallel to the guiding direction of light by applying a flat plate 3 on the top face of the barrier 2 to control the liquid surface to specified film thickness. Then the liquid is exposed through a mask 4 having a specified reverse pattern and developed to produce a master model 6 having the resist film 5 with the desired pattern. Then a metal thin film 7 is vapor deposited on the resist film 5 of the master model 6, electrically joined to an electrode plate 8 to obtain an upper mold 11 for molding having the reverse pattern. COPYRIGHT: (C)2004,JPO |
