LITHOGRAPHY DEVICE AND METHOD FOR MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an interferometer displacement measuring system of high precision to be used in a lithography projector even when the pressure and temperature in an optical path of measurement beams and reference beams are disturbed externally. SOLUTION: The measured values by an interference measurement system are corrected in relation to the variations in the state of the atmosphere such as that both in pressure and in temperature, and turbulence by using the measured values by a second harmonic interferometer 10. A ramp that indicates the dependence relationship of SHI data on the length of a channel is removed before the SHI data is used. It is possible for the SHI to use a passive Q-switched laser as a light source and a Brewster prism in a receiver module. Optical fibers can be used to guide light to a detector. A mirror 17 for reflecting the measurement beam has a coating whose thickness has been selected so that the sensitivity of the SHI data to the change in coating thickness will be reduced to the minimum level. COPYRIGHT: (C)2004,JPO