发明名称 |
Plasma processing system and apparatus and a sample processing method |
摘要 |
A plasma processing apparatus having a sample bench located in a vacuum chamber, a structure disposed at a position opposed to a sample placed on the sample bench and facing a plasma generated in the vacuum chamber, and at least one through-hole disposed in the structure through which a gas flows into the vacuum chamber. An optical transmitter is mounted on a back of the at least one through-hole through which light from the sample passes, which light is detected by way of the optical transmitter.
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申请公布号 |
US2004118518(A1) |
申请公布日期 |
2004.06.24 |
申请号 |
US20030732286 |
申请日期 |
2003.12.11 |
申请人 |
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发明人 |
MASUDA TOSHIO;USUI TATEHITO;SUEHIRO MITSURU;KANEKIYO HIROSHI;YAMAMOTO HIDEYUKI;TAKAHASHI KAZUE;ENAMI HIROMICHI |
分类号 |
H01L21/3065;H01J37/32;H01L21/00;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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