| 摘要 |
PURPOSE: A process chamber for cleaning an electrostatic chuck and a method thereof are provided to easily remove particles on the top surface of an electrostatic chuck cathode and prevent the damage of the electrostatic chuck cathode. CONSTITUTION: A process chamber(200) for cleaning an electrostatic chuck is provided with an upper chamber(110), a lower chamber(120), and an electrostatic chuck cathode(123) for sealing the bottom of the upper chamber and fixing a process object wafer using electrostatic force. The process chamber further includes a cathode lift(125) for moving the electrostatic chuck cathode up and down, a unit for cleaning an electrostatic chuck(130) jets cleaning gas to the electrostatic chuck cathode. And, the unit(130) includes a nozzle part(131) installed in the lower chamber, a cleaning gas supply pipe(133) connected with the nozzle, and a spin driving part(135).
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