Method for measuring the microrelief of an object and optical characteristics of near-surface layer, modulation interference microscope for carrying out said method

摘要

The invention relates to optical engineering, in particular to methods for measuring a microrelief, the distribution of optical material constants of a near-surface layer and can be used for microelectronic engineering, nanotechnology, material science, medicine and biology. The aim of the invention is to improve spatial resolution for mearsuring geometrical parameters of the relief and the distribution of the optical material constants, extend the range of defined constants including optical anisotropy constants, significantly increasing the accuracy of definition of the material constant and extending the number of objects studied. The inventive method for measuring microrelief and optical characteristics of the near-surface layer and a modulation interference microscope for carrying out said method are also disclosed.