发明名称 DENSE DUAL-PLANE DEVICES
摘要 A MOS device with first and second freestanding semiconductor bodies formed on a substrate. The first freestanding semiconductor body has a first portion thereof disposed at a non-orthogonal, non parallel orientation with respect to a first portion of the second freestanding semiconductor body. These portions of said first and second freestanding semiconductor bodies have respective first and second crystalline orientations. A first gate electrode crosses over at least part of said first portion of said first freestanding semiconductor body at a non-orthogonal angle, as does a second gate electrode over the first portion of the second freestanding semiconductor body.
申请公布号 US2004119100(A1) 申请公布日期 2004.06.24
申请号 US20020248123 申请日期 2002.12.19
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 NOWAK EDWARD J.;RAINEY BETHANN
分类号 H01L21/336;H01L21/8238;H01L27/092;H01L27/12;H01L29/786;(IPC1-7):H01L21/00;H01L29/94 主分类号 H01L21/336
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