| 发明名称 |
Fused silica pellicle in intimate contact with the surface of a photomask |
| 摘要 |
A fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle is to be intimately secured to the patterned surface of a photomask.
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| 申请公布号 |
US2004121248(A1) |
申请公布日期 |
2004.06.24 |
| 申请号 |
US20030733723 |
申请日期 |
2003.12.11 |
| 申请人 |
EYNON BEN |
发明人 |
EYNON BEN |
| 分类号 |
G03F1/14;(IPC1-7):G03F9/00;B44F1/00;A47G1/12;G03B27/62;G03B27/64;A61N5/00;G21G5/00 |
主分类号 |
G03F1/14 |
| 代理机构 |
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代理人 |
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