发明名称 Micro-lithographic projection exposure system, splits projection beam using polarization-dependent component, and combines to form output beam with parallel wavefronts
摘要 A polarization-dependent optical component is arranged in the beam path of a projection lens, for splitting the projection beam into two orthogonally polarized sub-beams (66,68) whose wavefronts (166,168) spread over an angle delta which is approximately equal to zero. A polarizing prism (60) is arranged behind the component for combining the two sub-beams into an output light beam (70) with parallel wavefronts (170,170').
申请公布号 DE10324466(A1) 申请公布日期 2004.06.24
申请号 DE20031024466 申请日期 2003.05.30
申请人 CARL ZEISS SMT AG 发明人 TOTZECK, MICHAEL
分类号 G03F7/20;(IPC1-7):G03F7/20 主分类号 G03F7/20
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