| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an apparatus for correcting a defect in a pattern, which corrects the defect on a photomask, by applying a pattern correcting material at an adequate size onto the defect in the pattern. <P>SOLUTION: The apparatus 1 for correcting the defect in the pattern comprises a material supply section 43 for supplying the pattern correcting material onto a substation 43, a head section 44 having a needle 441 and a control section 5 having a memory section 52 in which a conversion table 521 is stored. In the apparatus 1, a material applying distance is determined from the conversion table 521 based on the size of the defect on the photomask 9. The pattern correcting material is supplied onto the substation 42 and after the pattern correcting material is temporarily held while being exposed to outside air, the pattern correcting material is stuck to the tip of the needle 441. The control section 5 brings the needle 441 into proximity to the photomask 9 according to the material applying distance and the pattern correcting material is applied at the adequate size onto the defect on the photomask 9. <P>COPYRIGHT: (C)2004,JPO</p> |
